Magnetisation reversal and spin configurations in patterned magnetic structures

Abstract

The magnetization reversal process in a number of lithographically-patterned NiFe magnetic thin film structures has been investigated, using experimental characterization techniques and micromagnetic simulation. The patterned nanomagnets were fabricated using conventional electron beam lithography technique, as well as unconventional nanolithography techniques. A longitudinal magneto-optical Kerr effect magnetometery (MOKE) was constructed during the course of my PhD study and it was used to probe the magnetic hysteresis behaviour of the nanomagnet arrays. The spin configurations of the nanomagnets were imaged by using magnetic force microscope with in situ magnetic fields.