Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/5066
Title: Characterisation and applications of chemically amplified photoresists for DUV microlithography
Authors: Koh, Hui Peng.
Keywords: DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Nanoelectronics and interconnects
Issue Date: 2001
Abstract: This project aims to elucidate factors contributing to the pattern roughness for sub-180nm gate patterning from the aspects of material properties, nature of the aerial image quality and processing histories.
URI: http://hdl.handle.net/10356/5066
Rights: Nanyang Technological University
Fulltext Permission: restricted
Fulltext Availability: With Fulltext
Appears in Collections:MSE Theses

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