Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/5124
Title: Characterisation of ZnO thin films produced by filtered cathodic vacuum arc technique
Authors: Tse, Kit Yan.
Keywords: DRNTU::Engineering::Materials::Photonics and optoelectronics materials
Issue Date: 2004
Abstract: ZnO thin films were deposited on (100)Si substrates using filtered cathodic vacuum arc (FCVA) technique at various temperature (room temperature to 420 degree) and with different nitrogen to oxygen flow rate ratios (01. to 0.5) at 200 degree celsius.
URI: http://hdl.handle.net/10356/5124
Rights: Nanyang Technological University
Fulltext Permission: restricted
Fulltext Availability: With Fulltext
Appears in Collections:MSE Theses

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