Simulation of thermal behavior of silica glass and silicon with pulse laser heating

Abstract

This project made use of a 3D model to study the thermo behavior of silica glass

and silicon material under Continuous wave laser annealing (cw LA). Two

simulations were carried out to illustrate different scenarios, including static laser,

rotating wafer with moving laser. Simulated results of the temperature distribution

within the sample material are demonstrated for both models. Comparisons of

temperature distribution under different laser power density were shown. The

model is able to measure and predict processing temperature of the sample up to

its melting point.