Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/5277
Title: Development of sputtered SrBi2Ta2O9 thin films for nonvolatile random access memory application
Authors: Li, Yibin
Keywords: DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
Issue Date: 2007
Source: Li, Y. (2007). Development of sputtered SrBi2Ta2O9 thin films for nonvolatile random access memory application. Doctoral thesis, Nanyang Technological University, Singapore.
Abstract: Utilization of ferroelectric thin films for nonvolatile random access memory (NvRAM) applications has been under intensive investigation. Films for transistor-type memory require possessing these properties: a large remnant polarization, a low coercive field (2Ec), sufficient fatigue endurance against repetitive polarization switching. Layered perovskite structure SrBi2Ta2O9 (SBT) thin film has attracted ever increasing attention because it exhibits fatigue-free property up to 1012 cycles (even on Pt bottom electrode), excellent retention characteristics, and low leakage current density. However, two shortcomings are involved in SBT thin films: the low remnant polarization (2Pr<10?C/cm2) and high annealing temperature (>800?). Substitution at A or B site can effectively modify polarization properties. Trivalent elemental substitution such as Bi3+, La3+ and Nd3+ with the Sr2+ site induces A-site cation vacancies to satisfy charge neutrality, which significantly improves the low-field polarization.
URI: https://hdl.handle.net/10356/5277
DOI: 10.32657/10356/5277
Rights: Nanyang Technological University
Fulltext Permission: open
Fulltext Availability: With Fulltext
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