Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/54660
Title: TiO2 thin films by APCVD for photocatalytic applications
Authors: Chua, Chin Sheng.
Keywords: DRNTU::Engineering::Electrical and electronic engineering::Semiconductors
DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
Issue Date: 2013
Source: Chua, C. S. (2013). TiO2 thin films by APCVD for photocatalytic applications. Doctoral thesis, Nanyang Technological University, Singapore.
Abstract: Titanium dioxide thin film was deposited on glass using in-house built Atmospheric Pressure Chemical Vapor Deposition. The system was capable of depositing uniform coating on a large substrate and can be scaled-up easily for industrial applications. The deposited film consists of photocatalytic anatase phase and was shown to degrade both stearic acid and ethyl cellulose contaminations that were deposited on top of the films. Various modifications were carried out to improve the UV and visible light photo-response of the TiO2 film; thermal annealing, embedding photocatalytic particles (Anatase, rutile, P25 and SrTi(1-x)FexO3), tin-doping and deposition of TiO2/SnO2 bilayer. Among these various modifications, embedding P25 nanoparticles and-tin doping showed enhancement to the degradation rate of stearic acid under UV illumination. Other modifications suffered from a loss of photoactivity cause primarily by the introduction of recombination centers and increased in grain size.
URI: http://hdl.handle.net/10356/54660
metadata.item.grantfulltext: open
metadata.item.fulltext: With Fulltext
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