Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/5509
Title: Study of oxidation and wear behaviors of the Ti-based thin films using Raman spectroscopy
Authors: Zaw Moe Aung
Keywords: DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
Issue Date: 2003
Abstract: Wear and thermal oxidation behaviors of d c magnetron sputtered Ti-based thin films, TiN, TiCN (N rich), TiCN (C rich), TiAlN(Ti rich), AlTiN(Al rich),TiSiN and TiCNO were studied using Raman spectroscopy. The oxide surfaces after the static oxidation test and wear debris generated from pin-on-disc wear test with alumina ball were then characterized using Raman spectroscopy to identify compounds, especially oxides, generated during the wear process to gain a better understanding of tribochemical reactions. The results show that TiCN films have lowest friction and wear resistance and AlTiN and TiAIN films have highest thermal resistance. Contact temperatures were also estimated by comparison of the tribochemical products generated during sliding wear with the formation temperatures of oxides detected from static oxidation.
URI: http://hdl.handle.net/10356/5509
Rights: Nanyang Technological University
Fulltext Permission: restricted
Fulltext Availability: With Fulltext
Appears in Collections:MAE Theses

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