Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/5509
Full metadata record
DC FieldValueLanguage
dc.contributor.authorZaw Moe Aungen_US
dc.date.accessioned2008-09-17T10:52:21Z
dc.date.available2008-09-17T10:52:21Z
dc.date.copyright2003en_US
dc.date.issued2003
dc.identifier.urihttp://hdl.handle.net/10356/5509
dc.description.abstractWear and thermal oxidation behaviors of d c magnetron sputtered Ti-based thin films, TiN, TiCN (N rich), TiCN (C rich), TiAlN(Ti rich), AlTiN(Al rich),TiSiN and TiCNO were studied using Raman spectroscopy. The oxide surfaces after the static oxidation test and wear debris generated from pin-on-disc wear test with alumina ball were then characterized using Raman spectroscopy to identify compounds, especially oxides, generated during the wear process to gain a better understanding of tribochemical reactions. The results show that TiCN films have lowest friction and wear resistance and AlTiN and TiAIN films have highest thermal resistance. Contact temperatures were also estimated by comparison of the tribochemical products generated during sliding wear with the formation temperatures of oxides detected from static oxidation.en_US
dc.rightsNanyang Technological Universityen_US
dc.subjectDRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
dc.titleStudy of oxidation and wear behaviors of the Ti-based thin films using Raman spectroscopyen_US
dc.typeThesisen_US
dc.contributor.supervisorHsieh, Jang-Hsingen_US
dc.contributor.schoolSchool of Mechanical and Production Engineeringen_US
dc.description.degreeMaster of Science (Precision Engineering)en_US
item.fulltextWith Fulltext-
item.grantfulltextrestricted-
Appears in Collections:MAE Theses
Files in This Item:
File Description SizeFormat 
MAE-THESES_1238.pdf
  Restricted Access
11.14 MBAdobe PDFView/Open

Page view(s) 50

298
Updated on Jan 21, 2021

Download(s) 50

16
Updated on Jan 21, 2021

Google ScholarTM

Check

Items in DR-NTU are protected by copyright, with all rights reserved, unless otherwise indicated.