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|Title:||Fabrication of very high aspect micromold by SU-8 photolithography and electroforming||Authors:||Zhang, Jun||Keywords:||DRNTU::Engineering::Manufacturing||Issue Date:||2007||Source:||Zhang, J. (2007). Fabrication of very high aspect micromold by SU-8 photolithography and electroforming. Doctoral thesis, Nanyang Technological University, Singapore.||Abstract:||Microstructures with very high aspect ratio (VHAR) have diverse applications because the increased surface area leads to increased volume handling and sensitivity desired for many MicroElectro Systems (MEMS).||URI:||https://hdl.handle.net/10356/5524||DOI:||10.32657/10356/5524||Rights:||Nanyang Technological University||Fulltext Permission:||open||Fulltext Availability:||With Fulltext|
|Appears in Collections:||MAE Theses|
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