Please use this identifier to cite or link to this item:
https://hdl.handle.net/10356/5524| Title: | Fabrication of very high aspect micromold by SU-8 photolithography and electroforming | Authors: | Zhang, Jun | Keywords: | DRNTU::Engineering::Manufacturing | Issue Date: | 2007 | Source: | Zhang, J. (2007). Fabrication of very high aspect micromold by SU-8 photolithography and electroforming. Doctoral thesis, Nanyang Technological University, Singapore. | Abstract: | Microstructures with very high aspect ratio (VHAR) have diverse applications because the increased surface area leads to increased volume handling and sensitivity desired for many MicroElectro Systems (MEMS). | URI: | https://hdl.handle.net/10356/5524 | DOI: | 10.32657/10356/5524 | Rights: | Nanyang Technological University | Fulltext Permission: | open | Fulltext Availability: | With Fulltext |
| Appears in Collections: | MAE Theses |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| MAE-THESES_1251.pdf | 7.49 MB | Adobe PDF |  View/Open |
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