Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/5524
Title: Fabrication of very high aspect micromold by SU-8 photolithography and electroforming
Authors: Zhang, Jun
Keywords: DRNTU::Engineering::Manufacturing
Issue Date: 2007
Source: Zhang, J. (2007). Fabrication of very high aspect micromold by SU-8 photolithography and electroforming. Doctoral thesis, Nanyang Technological University, Singapore.
Abstract: Microstructures with very high aspect ratio (VHAR) have diverse applications because the increased surface area leads to increased volume handling and sensitivity desired for many MicroElectro Systems (MEMS).
URI: http://hdl.handle.net/10356/5524
Rights: Nanyang Technological University
Fulltext Permission: open
Fulltext Availability: With Fulltext
Appears in Collections:MAE Theses

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