Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/5524
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dc.contributor.authorZhang, Junen
dc.date.accessioned2008-09-17T10:52:39Zen
dc.date.available2008-09-17T10:52:39Zen
dc.date.copyright2007en
dc.date.issued2007en
dc.identifier.citationZhang, J. (2007). Fabrication of very high aspect micromold by SU-8 photolithography and electroforming. Doctoral thesis, Nanyang Technological University, Singapore.en
dc.identifier.urihttps://hdl.handle.net/10356/5524en
dc.description.abstractMicrostructures with very high aspect ratio (VHAR) have diverse applications because the increased surface area leads to increased volume handling and sensitivity desired for many MicroElectro Systems (MEMS).en
dc.rightsNanyang Technological Universityen
dc.subjectDRNTU::Engineering::Manufacturingen
dc.titleFabrication of very high aspect micromold by SU-8 photolithography and electroformingen
dc.typeThesisen
dc.contributor.supervisorChan Bee Eng, Maryen
dc.contributor.schoolSchool of Mechanical and Aerospace Engineeringen
dc.description.degreeDOCTOR OF PHILOSOPHY (MAE)en
dc.identifier.doi10.32657/10356/5524en
item.grantfulltextopen-
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