Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/5805
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dc.contributor.authorHuang, Xuen_US
dc.date.accessioned2008-09-17T10:59:34Z
dc.date.available2008-09-17T10:59:34Z
dc.date.copyright2004en_US
dc.date.issued2004
dc.identifier.urihttp://hdl.handle.net/10356/5805
dc.description.abstractThe present research has extensively investigated the properties of sputter deposited NiTi-based shape memory alloy thin films and the influencing factors.en_US
dc.rightsNanyang Technological Universityen_US
dc.subjectDRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
dc.titleDevelopment and characterization of Niti-based shape memory alloy thin films with special attention to the influencing factorsen_US
dc.typeThesisen_US
dc.contributor.supervisorLiu, Yongen_US
dc.contributor.schoolSchool of Mechanical and Production Engineeringen_US
dc.description.degreeDoctor of Philosophy (MPE)en_US
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