Please use this identifier to cite or link to this item:
Title: Development of photo-resist application process using pre-wet technique
Authors: Anup Ramachandran
Keywords: DRNTU::Engineering::Manufacturing
Issue Date: 2004
Abstract: This project studies the application of edge bead remover (EBR) chemical as a pre-wet before dispensing the photo-resist on to the wafer.
Rights: Nanyang Technological University
Fulltext Permission: restricted
Fulltext Availability: With Fulltext
Appears in Collections:MAE Theses

Files in This Item:
File Description SizeFormat 
  Restricted Access
4.19 MBAdobe PDFView/Open

Page view(s) 10

checked on Sep 28, 2020

Download(s) 10

checked on Sep 28, 2020

Google ScholarTM


Items in DR-NTU are protected by copyright, with all rights reserved, unless otherwise indicated.