Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/5873
Title: Development of photo-resist application process using pre-wet technique
Authors: Anup Ramachandran
Keywords: DRNTU::Engineering::Manufacturing
Issue Date: 2004
Abstract: This project studies the application of edge bead remover (EBR) chemical as a pre-wet before dispensing the photo-resist on to the wafer.
URI: http://hdl.handle.net/10356/5873
Rights: Nanyang Technological University
Fulltext Permission: restricted
Fulltext Availability: With Fulltext
Appears in Collections:MAE Theses

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