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https://hdl.handle.net/10356/6266
Title: | Novel system for direct writing of binary photomask using femtosecond laser | Authors: | Stanley, Paul. | Keywords: | DRNTU::Engineering::Manufacturing | Issue Date: | 2004 | Abstract: | Photomask is the backbone of semiconductor and other microfabrication industries. It is a high precision plate containing microscopic images of the miniaturized devices to be fabricated. A binary photomask is composed of transparent and opaque elements, which form one layer of a pattern. It is currently fabricated by the lithography process which is a complex process involving several steps and hence time consuming. | URI: | http://hdl.handle.net/10356/6266 | Schools: | School of Mechanical and Production Engineering | Rights: | Nanyang Technological University | Fulltext Permission: | restricted | Fulltext Availability: | With Fulltext |
Appears in Collections: | MAE Theses |
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MAE-THESES_733.pdf Restricted Access | 18.72 MB | Adobe PDF | View/Open |
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