Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/6266
Title: Novel system for direct writing of binary photomask using femtosecond laser
Authors: Stanley, Paul.
Keywords: DRNTU::Engineering::Manufacturing
Issue Date: 2004
Abstract: Photomask is the backbone of semiconductor and other microfabrication industries. It is a high precision plate containing microscopic images of the miniaturized devices to be fabricated. A binary photomask is composed of transparent and opaque elements, which form one layer of a pattern. It is currently fabricated by the lithography process which is a complex process involving several steps and hence time consuming.
URI: http://hdl.handle.net/10356/6266
Rights: Nanyang Technological University
Fulltext Permission: restricted
Fulltext Availability: With Fulltext
Appears in Collections:MAE Theses

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