dc.contributor.authorSun, Deenen_US
dc.date.accessioned2008-09-17T11:14:25Z
dc.date.accessioned2017-07-23T08:39:04Z
dc.date.available2008-09-17T11:14:25Z
dc.date.available2017-07-23T08:39:04Z
dc.date.copyright2005en_US
dc.date.issued2005
dc.identifier.citationSun, D. (2005). Magnetron sputtered nc-TiN/a-SiNx nanocomposite thin films with high hardness and high toughness. Doctoral thesis, Nanyang Technological University, Singapore.
dc.identifier.urihttp://hdl.handle.net/10356/6414
dc.description.abstractThis project focuses on the study of hardening and toughening mechanisms for nanocomposite thin films. The aim of this project is to study the relationship between microstructure, hardness and toughness, therefore to obtain a thin film with high hardness and at the same time high toughness. Reactive magnetron sputtering was used to prepare hard and superhard nc-TiN/a-Sinx nanocomposite thin films by co-sputtering Ti and Si3N4 targets in a gas mixture (argon and nitrogen). In order to improve the toughness of the as-prepared nanocomposite thin films, nickel was doped into the nc-TiN/a-SiNx to obtain Niiv toughened nc-TiN/a-SiNx nanocomposite thin films by co-sputtering TiNi, Ti and Si3N4 targets. Co-sputtering of multi targets allows to tailor the microstructure by adjusting the deposition parameters, such as target power density, deposition temperature, substrate bias, and gas ratio. The as-deposited Ni-toughened nc-TiN/a-SiNx nanocomposite thin films possess high hardness and high toughness.en_US
dc.rightsNanyang Technological Universityen_US
dc.subjectDRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
dc.titleMagnetron sputtered nc-TiN/a-SiNx nanocomposite thin films with high hardness and high toughnessen_US
dc.typeThesisen_US
dc.contributor.schoolSchool of Mechanical and Aerospace Engineeringen_US
dc.contributor.supervisorSam Zhang Shanyongen_US
dc.description.degreeDOCTOR OF PHILOSOPHY (MAE)en_US


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