Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/69317
Title: Development of the low cost transparent conductive thin films
Authors: Liao, Sisi
Keywords: DRNTU::Engineering
Issue Date: 2016
Abstract: Zinc Oxide (ZnO) - based transparent conductive oxide (TCO) thin films have attracted much attention to be an alternative choice instead of currently used Indium-tin-oxide (ITO) thin films in transparent electrode applications. However, it is not clear yet which dopant has the best performance on the ZnO-based transparent conductive thin films, and also there are limits on the development and practical applications. This project is focused on development of low cost transparent conductive thin film, from the economical and conductivity concern, the dopants Galium (Ga) and Aluminium (Al) were chosen in the experiments for comparison. The optimizations on these parameters: (1) no doping and doping concentration from 1.0 mole% to 2.0 mole% of ZnO solution; (2) spin-coating speed of the solution; (3) numbers of coating layers; (4) annealing temperature were carried out for achieving the best performance.
URI: http://hdl.handle.net/10356/69317
Rights: Nanyang Technological University
Fulltext Permission: restricted
Fulltext Availability: With Fulltext
Appears in Collections:EEE Student Reports (FYP/IA/PA/PI)

Files in This Item:
File Description SizeFormat 
FYP_FinalReport.pdf
  Restricted Access
1.45 MBAdobe PDFView/Open

Page view(s)

96
Updated on May 13, 2021

Download(s) 50

17
Updated on May 13, 2021

Google ScholarTM

Check

Items in DR-NTU are protected by copyright, with all rights reserved, unless otherwise indicated.