Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/6969
Title: Reaction micro- and nano-imprint lithography with polymers
Authors: Chan, Mary Bee Eng.
Keywords: DRNTU::Engineering::Chemical engineering
Issue Date: 2004
Abstract: The objectives of the proposed Project are as follows: a) Development of High Aspect Ratio Micro- and Nano-Imprint Lithography for patterning over large surface areas. b) Development of soft-on-hard mold technology as an enabling technology for low pressure molding of high aspect ratio polymeric micro-structures and nano-structures. c) Development of ultrathin polymer film coating or grafting for release application. d) Development of novel release coating with good release and durability.
URI: http://hdl.handle.net/10356/6969
Rights: Nanyang Technological University
Fulltext Permission: restricted
Fulltext Availability: With Fulltext
Appears in Collections:MAE Research Reports (Staff & Graduate Students)

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