Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/76873
Title: Optimization of thermal imaging techniques in failure analysis
Authors: Sidambararajan, Preethy Sudhan
Keywords: DRNTU::Engineering::Electrical and electronic engineering
Issue Date: 2019
Abstract: Lock-in thermography (LIT) has been gaining more attention from the research community for non-destructive evaluation of integrated circuits (IC) and localization of thermal active electrical defects in microelectronics and circuit reliability research. Thermal imaging is considered to be the standard technology in the field of IC failure analysis. This thesis presents the following: 1) optimization scheme for thermal imaging techniques is proposed to calibrate with the LIT and identify the root cause of the failure in IC packages, 2) ultra-violet (UV) thermal imaging technique is introduced with LIT for failure analysis. Experiments are conducted under real-world environment. The results show that the proposed optimization techniques improves both the validation time and accuracy of the conventional thermal imaging techniques for the failure analysis. Furthermore, an investigation is carried out to identify the potential of UV thermal imaging LIT for the failure analysis.
URI: http://hdl.handle.net/10356/76873
Schools: School of Electrical and Electronic Engineering 
Organisations: Technical University of Munich
Fulltext Permission: restricted
Fulltext Availability: With Fulltext
Appears in Collections:EEE Theses

Files in This Item:
File Description SizeFormat 
MSc_dissertation_amended thesis.pdf
  Restricted Access
3.96 MBAdobe PDFView/Open

Page view(s)

409
Updated on Jul 20, 2024

Download(s)

17
Updated on Jul 20, 2024

Google ScholarTM

Check

Items in DR-NTU are protected by copyright, with all rights reserved, unless otherwise indicated.