Deposition and characterization of Bismuth nanofilm by sputtering

Abstract

Bismuthene, a layer of bismuth atoms, is predicted to be layered semiconductor, while its bulk counterpart is metallic. In this project, fabrication of bismuth thin films under different conditions will be done using the new sputtering system in NTU Nanoelectronics Lab 1 (NEL1) and characterization of the nanofilms will also be done using techniques such as Raman spectroscopy and Energy-dispersive X-ray spectroscopy. Atomic force microscopy will also be utilized to measure the thickness of the nanofilms and to ascertain the topology of the sample surface.