Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/79423
Title: Subwavelength interference lithography based on a unidirectional surface plasmon coupler
Authors: Zhang, Shuxia
Zhang, Dao Hua
Wang, Yueke
Wang, Jian
Yang, Xuefeng
Keywords: DRNTU::Engineering::Electrical and electronic engineering::Antennas, wave guides, microwaves, radar, radio
DRNTU::Engineering::Electrical and electronic engineering::Optics, optoelectronics, photonics
Issue Date: 2013
Source: Yang, X., Zhang, S., Zhang, D. H., Wang, Y., & Wang, J. (2013). Subwavelength interference lithography based on a unidirectional surface plasmon coupler. Optical engineering, 52(8), 086109-.
Series/Report no.: Optical engineering
Abstract: A subwavelength interference lithography method is numerically demonstrated based on surface plasmon polaritons excited by unidirectional couplers, and the unidirectional coupler is composed of a conventional nanoslit with a nanochannel excavated from one side of this nanoslit. Simulation results show that a feature size of 50 nm half-pitch pattern can be obtained at the working wavelength of 365 nm, and this method can enhance the intensity of the interference pattern with higher contrast and field depth and is advantageous to the fabrication process in practical applications.
URI: https://hdl.handle.net/10356/79423
http://hdl.handle.net/10220/25326
ISSN: 0091-3286
DOI: 10.1117/1.OE.52.8.086109
Rights: © 2013 Society of Photo-optical Instrumentation Engineers. This paper was published in Optical Engineering and is made available as an electronic reprint (preprint) with permission of Society of Photo-optical Instrumentation Engineers. The paper can be found at the following official DOI: [http://dx.doi.org/10.1117/1.OE.52.8.086109].  One print or electronic copy may be made for personal use only. Systematic or multiple reproduction, distribution to multiple locations via electronic or other means, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper is prohibited and is subject to penalties under law.
Fulltext Permission: open
Fulltext Availability: With Fulltext
Appears in Collections:EEE Journal Articles

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