Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/81084
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dc.contributor.authorPrabhathan, Patinharekandyen
dc.contributor.authorMurukeshan, Vadakke Mathamen
dc.date.accessioned2015-12-17T02:58:49Zen
dc.date.accessioned2019-12-06T14:21:04Z-
dc.date.available2015-12-17T02:58:49Zen
dc.date.available2019-12-06T14:21:04Z-
dc.date.issued2015en
dc.identifier.citationPrabhathan, P., & Murukeshan, V. M. (2015). Dielectric supported bimetal layer configuration for long-range surface plasmon polariton interference–based subwavelength lithography. Optical Engineering, 54(9), 097107-.en
dc.identifier.issn0091-3286en
dc.identifier.urihttps://hdl.handle.net/10356/81084-
dc.description.abstractLong-range surface plasmon polariton (LRSPP) interference in a dielectric supported bimetal layer configuration is analyzed for nanoscale periodic feature fabrication. The single metal layer in a conventional configuration has been split into a bimetal layer configuration supported by a dielectric layer to enable LRSPP interference in different layers. It is shown that the configuration can be implemented in two different ways to record the interference pattern with high exposure depth and high contrast. Subwavelength periodic pattern having a half-pitch resolution of 65 nm at 446-nm wavelength is illustrated with the proposed two-beam and four-beam LRSPP interference configurations.en
dc.description.sponsorshipMOE (Min. of Education, S’pore)en
dc.format.extent4 p.en
dc.language.isoenen
dc.relation.ispartofseriesOptical Engineeringen
dc.rights© 2015 Society of Photo-optical Instrumentation Engineers.This paper was published in Optical Engineering and is made available as an electronic reprint (preprint) with permission of Society of Photo-optical Instrumentation Engineers. The published version is available at: [http://dx.doi.org/10.1117/1.OE.54.9.097107]. One print or electronic copy may be made for personal use only. Systematic or multiple reproduction, distribution to multiple locations via electronic or other means, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper is prohibited and is subject to penalties under law.en
dc.subjectSurface plasmonsen
dc.subjectPlasmonicsen
dc.subjectNanolithographyen
dc.titleDielectric supported bimetal layer configuration for long-range surface plasmon polariton interference–based subwavelength lithographyen
dc.typeJournal Articleen
dc.contributor.schoolSchool of Mechanical and Aerospace Engineeringen
dc.identifier.doi10.1117/1.OE.54.9.097107en
dc.description.versionPublished versionen
dc.identifier.rims189846en
item.grantfulltextopen-
item.fulltextWith Fulltext-
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