Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/81274
Title: Reconfigurable phase-change photomask for grayscale photolithography
Authors: Wang, Q.
Yuan, Guanghui
Kiang, K. S.
Sun, K.
Gholipour, B.
Rogers, E. T. F.
Huang, K.
Ang, S. S.
Zheludev, Nikolay I.
Teng, J. H.
Keywords: Semiconductors
Femtosecond Lasers
DRNTU::Science::Physics
Issue Date: 2017
Source: Wang, Q., Yuan, G., Kiang, K. S., Sun, K., Gholipour, B., Rogers, E. T. F., ... Teng, J. H. (2017). Reconfigurable phase-change photomask for grayscale photolithography. Applied Physics Letters, 110(20), 201110-. doi:10.1063/1.4983198
Series/Report no.: Applied Physics Letters
Abstract: We demonstrate a grayscale photolithography technique which uses a thin phase-change film as a photomask to locally control the exposure dose and allows three-dimensional (3D) sculpting photoresist for the manufacture of 3D structures. Unlike traditional photomasks, the transmission of the phase-change material photomask can be set to an arbitrary gray level with submicron lateral resolution, and the mask pattern can be optically reconfigured on demand, by inducing a refractive-index-changing phase-transition with femtosecond laser pulses. We show a spiral phase plate and a phase-type super-oscillatory lens fabricated on Si wafers to demonstrate the range of applications that can be addressed with this technique.
URI: https://hdl.handle.net/10356/81274
http://hdl.handle.net/10220/47486
ISSN: 0003-6951
DOI: 10.1063/1.4983198
Schools: School of Physical and Mathematical Sciences 
Research Centres: The Photonics Institute 
Centre for Disruptive Photonic Technologies (CDPT) 
Rights: © 2017 American Institute of Physics. All rights reserved. This paper was published in Applied Physics Letters and is made available with permission of American Institute of Physics.
Fulltext Permission: open
Fulltext Availability: With Fulltext
Appears in Collections:SPMS Journal Articles

Files in This Item:
File Description SizeFormat 
Reconfigurable phase-change photomask for grayscale photolithography.pdf1.26 MBAdobe PDFThumbnail
View/Open

SCOPUSTM   
Citations 20

18
Updated on Sep 20, 2023

Web of ScienceTM
Citations 20

18
Updated on Sep 22, 2023

Page view(s) 50

434
Updated on Sep 25, 2023

Download(s) 50

142
Updated on Sep 25, 2023

Google ScholarTM

Check

Altmetric


Plumx

Items in DR-NTU are protected by copyright, with all rights reserved, unless otherwise indicated.