Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/81274
Title: Reconfigurable phase-change photomask for grayscale photolithography
Authors: Wang, Q.
Yuan, Guanghui
Kiang, K. S.
Sun, K.
Gholipour, B.
Rogers, E. T. F.
Huang, K.
Ang, S. S.
Zheludev, Nikolay I.
Teng, J. H.
Keywords: Semiconductors
Femtosecond Lasers
DRNTU::Science::Physics
Issue Date: 2017
Source: Wang, Q., Yuan, G., Kiang, K. S., Sun, K., Gholipour, B., Rogers, E. T. F., ... Teng, J. H. (2017). Reconfigurable phase-change photomask for grayscale photolithography. Applied Physics Letters, 110(20), 201110-. doi:10.1063/1.4983198
Series/Report no.: Applied Physics Letters
Abstract: We demonstrate a grayscale photolithography technique which uses a thin phase-change film as a photomask to locally control the exposure dose and allows three-dimensional (3D) sculpting photoresist for the manufacture of 3D structures. Unlike traditional photomasks, the transmission of the phase-change material photomask can be set to an arbitrary gray level with submicron lateral resolution, and the mask pattern can be optically reconfigured on demand, by inducing a refractive-index-changing phase-transition with femtosecond laser pulses. We show a spiral phase plate and a phase-type super-oscillatory lens fabricated on Si wafers to demonstrate the range of applications that can be addressed with this technique.
URI: https://hdl.handle.net/10356/81274
http://hdl.handle.net/10220/47486
ISSN: 0003-6951
DOI: 10.1063/1.4983198
Rights: © 2017 American Institute of Physics. All rights reserved. This paper was published in Applied Physics Letters and is made available with permission of American Institute of Physics.
Fulltext Permission: open
Fulltext Availability: With Fulltext
Appears in Collections:SPMS Journal Articles

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