Please use this identifier to cite or link to this item:
https://hdl.handle.net/10356/81274
Title: | Reconfigurable phase-change photomask for grayscale photolithography | Authors: | Wang, Q. Yuan, Guanghui Kiang, K. S. Sun, K. Gholipour, B. Rogers, E. T. F. Huang, K. Ang, S. S. Zheludev, Nikolay I. Teng, J. H. |
Keywords: | Semiconductors Femtosecond Lasers DRNTU::Science::Physics |
Issue Date: | 2017 | Source: | Wang, Q., Yuan, G., Kiang, K. S., Sun, K., Gholipour, B., Rogers, E. T. F., ... Teng, J. H. (2017). Reconfigurable phase-change photomask for grayscale photolithography. Applied Physics Letters, 110(20), 201110-. doi:10.1063/1.4983198 | Series/Report no.: | Applied Physics Letters | Abstract: | We demonstrate a grayscale photolithography technique which uses a thin phase-change film as a photomask to locally control the exposure dose and allows three-dimensional (3D) sculpting photoresist for the manufacture of 3D structures. Unlike traditional photomasks, the transmission of the phase-change material photomask can be set to an arbitrary gray level with submicron lateral resolution, and the mask pattern can be optically reconfigured on demand, by inducing a refractive-index-changing phase-transition with femtosecond laser pulses. We show a spiral phase plate and a phase-type super-oscillatory lens fabricated on Si wafers to demonstrate the range of applications that can be addressed with this technique. | URI: | https://hdl.handle.net/10356/81274 http://hdl.handle.net/10220/47486 |
ISSN: | 0003-6951 | DOI: | 10.1063/1.4983198 | Rights: | © 2017 American Institute of Physics. All rights reserved. This paper was published in Applied Physics Letters and is made available with permission of American Institute of Physics. | Fulltext Permission: | open | Fulltext Availability: | With Fulltext |
Appears in Collections: | SPMS Journal Articles |
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Reconfigurable phase-change photomask for grayscale photolithography.pdf | 1.26 MB | Adobe PDF | ![]() View/Open |
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