Please use this identifier to cite or link to this item:
https://hdl.handle.net/10356/81512
Title: | In-situ Scanning Micro-Electrochemical Characterization of Corrosion Inhibitors on Copper | Authors: | Zhang, Bowei Wu, Junsheng Peng, Dongdong Li, Xiaogang Huang, Yizhong |
Keywords: | In-situ SVET |
Issue Date: | 2016 | Source: | Zhang, B., Wu, J., Peng, D., Li, X., & Huang, Y. (2016). In-situ Scanning Micro-Electrochemical Characterization of Corrosion Inhibitors on Copper. International Journal of Electrochemical Science, 11, 4110-4119. | Series/Report no.: | International Journal of Electrochemical Science | Abstract: | In-situ scanning vibrating electrode technique (SVET) combined with other techniques (such as electrochemical impedance spectroscopy (EIS), atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS)) was used to investigate the efficiency of the mixed compound of 3-amino-1, 2, 4-triazole (ATA) and sodium molybdate (SM) as a corrosion inhibitor for copper in 3.5% NaCl solution in comparison with benzotriazole (BTA). The results indicate that copper shows extremely higher corrosion resistance in 3.5% NaCl solution with the presence of ATA-SM inhibitor than BTA. This is due to the reaction of ATA with copper allowing the formation of a thin film incorporated with MoO4 ion precipitates on the surface of copper, which provides strong cathodic efficiency and thus is considerably protective. | URI: | https://hdl.handle.net/10356/81512 http://hdl.handle.net/10220/40846 |
ISSN: | 1452-3981 | DOI: | 10.20964/110367 | Schools: | School of Materials Science & Engineering | Rights: | © 2016 The Authors. Published by ESG (www.electrochemsci.org). This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution license (http://creativecommons.org/licenses/by/4.0/). | Fulltext Permission: | open | Fulltext Availability: | With Fulltext |
Appears in Collections: | MSE Journal Articles |
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