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https://hdl.handle.net/10356/81512
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DC Field | Value | Language |
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dc.contributor.author | Zhang, Bowei | en |
dc.contributor.author | Wu, Junsheng | en |
dc.contributor.author | Peng, Dongdong | en |
dc.contributor.author | Li, Xiaogang | en |
dc.contributor.author | Huang, Yizhong | en |
dc.date.accessioned | 2016-06-29T08:50:17Z | en |
dc.date.accessioned | 2019-12-06T14:32:40Z | - |
dc.date.available | 2016-06-29T08:50:17Z | en |
dc.date.available | 2019-12-06T14:32:40Z | - |
dc.date.issued | 2016 | en |
dc.identifier.citation | Zhang, B., Wu, J., Peng, D., Li, X., & Huang, Y. (2016). In-situ Scanning Micro-Electrochemical Characterization of Corrosion Inhibitors on Copper. International Journal of Electrochemical Science, 11, 4110-4119. | en |
dc.identifier.issn | 1452-3981 | en |
dc.identifier.uri | https://hdl.handle.net/10356/81512 | - |
dc.description.abstract | In-situ scanning vibrating electrode technique (SVET) combined with other techniques (such as electrochemical impedance spectroscopy (EIS), atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS)) was used to investigate the efficiency of the mixed compound of 3-amino-1, 2, 4-triazole (ATA) and sodium molybdate (SM) as a corrosion inhibitor for copper in 3.5% NaCl solution in comparison with benzotriazole (BTA). The results indicate that copper shows extremely higher corrosion resistance in 3.5% NaCl solution with the presence of ATA-SM inhibitor than BTA. This is due to the reaction of ATA with copper allowing the formation of a thin film incorporated with MoO4 ion precipitates on the surface of copper, which provides strong cathodic efficiency and thus is considerably protective. | en |
dc.description.sponsorship | MOE (Min. of Education, S’pore) | en |
dc.format.extent | 10 p. | en |
dc.language.iso | en | en |
dc.relation.ispartofseries | International Journal of Electrochemical Science | en |
dc.rights | © 2016 The Authors. Published by ESG (www.electrochemsci.org). This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution license (http://creativecommons.org/licenses/by/4.0/). | en |
dc.subject | In-situ | en |
dc.subject | SVET | en |
dc.title | In-situ Scanning Micro-Electrochemical Characterization of Corrosion Inhibitors on Copper | en |
dc.type | Journal Article | en |
dc.contributor.school | School of Materials Science & Engineering | en |
dc.identifier.doi | 10.20964/110367 | en |
dc.description.version | Published version | en |
item.fulltext | With Fulltext | - |
item.grantfulltext | open | - |
Appears in Collections: | MSE Journal Articles |
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In-situ Scanning Micro-Electrochemical Characterization.pdf | 416.91 kB | Adobe PDF | ![]() View/Open |
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