Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/8172
Title: Photochemical degradation of nitroaromatic pollutants using UV-based advanced oxidation technologies
Authors: Chen, Bing.
Keywords: DRNTU::Engineering::Environmental engineering
Issue Date: 1999
Abstract: Nitroaromatic compounds, such as nitrobenzene and nitrophenols, are present in industrial effluents from the production of dyestuffs, pesticides and various organic intermediates. They are considered as toxic and hazardous substances by the Pollution Control Department (PCD) of the Ministry of the Environment of Singapore, and the United State of America Environmental Protection Agency (U.S.-EPA). Detoxification of contaminated aromatic wastewaters is very difficult, since this class of organics is often highly resistant to microbial degradation. Recently, UV-based Advanced Oxidation Technologies have attracted more attention because of their effectiveness in the mineralization of organic pollutants.
URI: http://hdl.handle.net/10356/8172
Rights: Nanyang Technological University
Fulltext Permission: restricted
Fulltext Availability: With Fulltext
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