Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/82762
Title: Applications of atomic layer deposition in solar cells
Authors: Niu, Wenbin
Li, Xianglin
Karuturi, Siva Krishna
Fam, Derrick Wenhui
Fan, Hongjin
Shrestha, Santosh
Wong, Lydia Helena
Tok, Alfred Iing Yoong
Keywords: bandstructure engineering
surface passivation
Issue Date: 2015
Source: Niu, W., Li, X., Karuturi, S. K., Fam, D. W., Fan, H., Shrestha, S., et al. (2015). Applications of atomic layer deposition in solar cells. Nanotechnology, 26(6), 064001-.
Series/Report no.: Nanotechnology
Abstract: Atomic layer deposition (ALD) provides a unique tool for the growth of thin films with excellent conformity and thickness control down to atomic levels. The application of ALD in energy research has received increasing attention in recent years. In this review, the versatility of ALD in solar cells will be discussed. This is specifically focused on the fabrication of nanostructured photoelectrodes, surface passivation, surface sensitization, and band-structure engineering of solar cell materials. Challenges and future directions of ALD in the applications of solar cells are also discussed.
URI: https://hdl.handle.net/10356/82762
http://hdl.handle.net/10220/40275
ISSN: 0957-4484
DOI: 10.1088/0957-4484/26/6/064001
Rights: © 2015 IOP Publishing Ltd. Content from this work may be used under the terms of the Creative Commons Attribution 3.0 licence. Any further distribution of this work must maintain attribution to the author(s) and the title of the work, journal citation and DOI.
Fulltext Permission: open
Fulltext Availability: With Fulltext
Appears in Collections:MSE Journal Articles
SPMS Journal Articles

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