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https://hdl.handle.net/10356/83778
Title: | Formulating an Ideal Protein Photoresist for Fabricating Dynamic Microstructures with High Aspect Ratios and Uniform Responsiveness | Authors: | Lay, Chee Leng Lee, Yih Hong Lee, Mian Rong Phang, In Yee Ling, Xing Yi |
Keywords: | Bovine Serum Albumin Free-standing Microstructures |
Issue Date: | 2016 | Source: | Lay, C. L., Lee, Y. H., Lee, M. R., Phang, I. Y., & Ling, X. Y. (2016). Formulating an Ideal Protein Photoresist for Fabricating Dynamic Microstructures with High Aspect Ratios and Uniform Responsiveness. ACS Applied Materials & Interfaces, 8(12), 8145-8153. | Series/Report no.: | ACS Applied Materials & Interfaces | Abstract: | The physical properties of aqueous-based stimuli-responsive photoresists are crucial in fabricating microstructures with high structural integrity and uniform responsiveness during two-photon lithography. Here, we quantitatively investigate how various components within bovine serum albumin (BSA) photoresists affect our ability to achieve BSA microstructures with consistent stimuli-responsive properties over areas exceeding 104 μm2. We unveil a relationship between BSA concentration and dynamic viscosity, establishing a threshold viscosity to achieve robust BSA microstructures. We also demonstrate the addition of an inert polymer to the photoresist as viscosity enhancer. A set of systematically optimized processing parameters is derived for the construction of dynamic BSA microstructures. The optimized BSA photoresists and processing parameters enable us to extend the two-dimensional (2D) microstructures to three-dimensional (3D) ones, culminating in arrays of micropillars with aspect ratio > 10. Our findings foster the development of liquid stimuli-responsive photoresists to build multifunctional complex 3D geometries for applications such as bioimplantable devices or adaptive photonic systems. | URI: | https://hdl.handle.net/10356/83778 http://hdl.handle.net/10220/42796 |
ISSN: | 1944-8244 | DOI: | 10.1021/acsami.6b02306 | Schools: | School of Physical and Mathematical Sciences | Rights: | © 2016 American Chemical Society. This is the author created version of a work that has been peer reviewed and accepted for publication by ACS Applied Materials & Interfaces, American Chemical Society. It incorporates referee’s comments but changes resulting from the publishing process, such as copyediting, structural formatting, may not be reflected in this document. The published version is available at: [http://dx.doi.org/10.1021/acsami.6b02306]. | Fulltext Permission: | open | Fulltext Availability: | With Fulltext |
Appears in Collections: | SPMS Journal Articles |
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Formulating an Ideal Protein Photoresist for Fabricating Dynamic Microstructures with High Aspect Ratios.pdf | 2.06 MB | Adobe PDF | ![]() View/Open |
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