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https://hdl.handle.net/10356/84046
Title: | TiN-Mediated Multi-Level Negative Photoconductance of the ZrO2 Breakdown Path | Authors: | Zhou, Yu Kawashima, Tomohito Ang, Diing Shenp |
Keywords: | High-k oxide Negative photoconductivity |
Issue Date: | 2017 | Source: | Zhou, Y., Kawashima, T., & Ang, D. S. (2017). TiN-Mediated Multi-Level Negative Photoconductance of the ZrO2 Breakdown Path. IEEE Journal of the Electron Devices Society, 5(3), 188-192. | Series/Report no.: | IEEE Journal of the Electron Devices Society | Abstract: | We present new evidence that the non-volatile negative photoconductivity (NPC) response of the ZrO2 breakdown path can be suppressed or tuned to different levels by repeated application of a positive voltage-bias on the TiN electrode prior to light exposure. A negative voltage-bias does not produce such a tuning effect but can restore the NPC response suppressed by the positive voltage-bias before a re-breakdown step. In samples with a non-metal (Si) electrode, the NPC tuning effect is absent indicating that a positively biased TiN electrode is needed to produce the tuning effect. We hypothesize that a positive voltage may induce the migration of Ti ions into the vacancy sites in the breakdown path. This then prevents the photo-assisted recombination of the interstitial-vacancy defect pairs, leading to a modulated NPC response. A negative voltage-bias expels the Ti ions back to the electrode and restores the NPC response. | URI: | https://hdl.handle.net/10356/84046 http://hdl.handle.net/10220/42904 |
ISSN: | 2168-6734 | DOI: | 10.1109/JEDS.2017.2678469 | Rights: | © 2017 IEEE. Translations and content mining are permitted for academic research only. Personal use is also permitted, but republication/redistribution requires IEEE permission. See http://www.ieee.org/publications_standards/publications/rights/index.html for more information. | Fulltext Permission: | open | Fulltext Availability: | With Fulltext |
Appears in Collections: | EEE Journal Articles |
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