Please use this identifier to cite or link to this item:
https://hdl.handle.net/10356/84046
Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Zhou, Yu | en |
dc.contributor.author | Kawashima, Tomohito | en |
dc.contributor.author | Ang, Diing Shenp | en |
dc.date.accessioned | 2017-07-18T05:27:43Z | en |
dc.date.accessioned | 2019-12-06T15:37:10Z | - |
dc.date.available | 2017-07-18T05:27:43Z | en |
dc.date.available | 2019-12-06T15:37:10Z | - |
dc.date.issued | 2017 | en |
dc.identifier.citation | Zhou, Y., Kawashima, T., & Ang, D. S. (2017). TiN-Mediated Multi-Level Negative Photoconductance of the ZrO2 Breakdown Path. IEEE Journal of the Electron Devices Society, 5(3), 188-192. | en |
dc.identifier.issn | 2168-6734 | en |
dc.identifier.uri | https://hdl.handle.net/10356/84046 | - |
dc.description.abstract | We present new evidence that the non-volatile negative photoconductivity (NPC) response of the ZrO2 breakdown path can be suppressed or tuned to different levels by repeated application of a positive voltage-bias on the TiN electrode prior to light exposure. A negative voltage-bias does not produce such a tuning effect but can restore the NPC response suppressed by the positive voltage-bias before a re-breakdown step. In samples with a non-metal (Si) electrode, the NPC tuning effect is absent indicating that a positively biased TiN electrode is needed to produce the tuning effect. We hypothesize that a positive voltage may induce the migration of Ti ions into the vacancy sites in the breakdown path. This then prevents the photo-assisted recombination of the interstitial-vacancy defect pairs, leading to a modulated NPC response. A negative voltage-bias expels the Ti ions back to the electrode and restores the NPC response. | en |
dc.description.sponsorship | MOE (Min. of Education, S’pore) | en |
dc.format.extent | 5 p. | en |
dc.language.iso | en | en |
dc.relation.ispartofseries | IEEE Journal of the Electron Devices Society | en |
dc.rights | © 2017 IEEE. Translations and content mining are permitted for academic research only. Personal use is also permitted, but republication/redistribution requires IEEE permission. See http://www.ieee.org/publications_standards/publications/rights/index.html for more information. | en |
dc.subject | High-k oxide | en |
dc.subject | Negative photoconductivity | en |
dc.title | TiN-Mediated Multi-Level Negative Photoconductance of the ZrO2 Breakdown Path | en |
dc.type | Journal Article | en |
dc.contributor.school | School of Electrical and Electronic Engineering | en |
dc.identifier.doi | 10.1109/JEDS.2017.2678469 | en |
dc.description.version | Published version | en |
item.fulltext | With Fulltext | - |
item.grantfulltext | open | - |
Appears in Collections: | EEE Journal Articles |
Files in This Item:
File | Description | Size | Format | |
---|---|---|---|---|
TiN-Mediated Multi-Level Negative Photoconductance of the ZrO2 Breakdown Path.pdf | 879.02 kB | Adobe PDF | ![]() View/Open |
SCOPUSTM
Citations
20
4
Updated on Mar 10, 2021
PublonsTM
Citations
20
4
Updated on Mar 3, 2021
Page view(s)
236
Updated on Apr 19, 2021
Download(s) 50
63
Updated on Apr 19, 2021
Google ScholarTM
Check
Altmetric
Items in DR-NTU are protected by copyright, with all rights reserved, unless otherwise indicated.