Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/86092
Title: Surface engineering on continuous VO2 thin films to improve thermochromic properties : top-down acid etching and bottom-up self-patterning
Authors: Wang, Ning
Peh, Yew Keat
Magdassi, Shlomo
Long, Yi
Keywords: Surface Engineering
Thermochromic Properties
Engineering::Materials
Issue Date: 2018
Source: Wang, N., Peh, Y. K., Magdassi, S., & Long, Y. (2018). Surface engineering on continuous VO2 thin films to improve thermochromic properties : Top-down acid etching and bottom-up self-patterning. Journal of Colloid and Interface Science, 512, 529-535. doi:10.1016/j.jcis.2017.10.096
Series/Report no.: Journal of Colloid and Interface Science
Abstract: Surface engineering is an effective method to improve the thermochromic performance of VO2. In this paper, an acid-etching top down method was proposed to tailor the VO2 surface morphology from the continuous dense-packed surface to patterned structure, which exhibited the enhanced integrated visible transmittance (Tlum) and the enlarged solar modulating abilities (ΔTsol). Moreover, a self-patterning approach was also illustrated to improve the thermochromic properties. The proposed surface engineering methods represent a facile and cost-effective approach for enhancing thermochromic properties that could promote the application of VO2 thin films in smart windows.
URI: https://hdl.handle.net/10356/86092
http://hdl.handle.net/10220/49253
ISSN: 0021-9797
DOI: 10.1016/j.jcis.2017.10.096
Schools: School of Materials Science & Engineering 
Rights: © 2017 Elsevier Inc. All rights reserved.
Fulltext Permission: none
Fulltext Availability: No Fulltext
Appears in Collections:MSE Journal Articles

SCOPUSTM   
Citations 20

31
Updated on May 6, 2025

Web of ScienceTM
Citations 20

20
Updated on Oct 29, 2023

Page view(s)

370
Updated on May 4, 2025

Google ScholarTM

Check

Altmetric


Plumx

Items in DR-NTU are protected by copyright, with all rights reserved, unless otherwise indicated.