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Title: Stacked dual beam electron optical system for THz integrated wideband traveling wave tube
Authors: Shao, Wei
Xu, Duo
Wang, Zhanliang
Gong, Huarong
Lu, Zhigang
Duan, Zhaoyun
Wei, Yanyu
Gong, Yubin
Aditya, Sheel
Keywords: Slow Wave Structure
Vacuum Tubes
Engineering::Electrical and electronic engineering
Issue Date: 2019
Source: Shao, W., Xu, D., Wang, Z., Gong, H., Lu, Z., Duan, Z., . . . Aditya, S. (2019). Stacked dual beam electron optical system for THz integrated wideband traveling wave tube. Physics of Plasmas, 26(6), 063106-. doi:10.1063/1.5096331
Series/Report no.: Physics of Plasmas
Abstract: In this paper, a stacked dual beam electron gun and the associated electron optical system are proposed. The stacked dual beam electron gun includes two compact focusing electrodes which help to achieve dual sheet beams. As an application of this dual beam electron gun, a 340 GHz integrated dual beam traveling wave tube (TWT) based on the staggered dual vane slow-wave structure (SWS) is also put forward. In order to reduce the length of the TWT, a novel input/output coupler is introduced. The overall transmission characteristics of the SWS structure together with the input/output couplers show a wide bandwidth covering a frequency range of 306 GHz to 360 GHz. Based on the parameters obtained for the integrated TWT, a stacked dual-beam electron gun with dual focusing electrodes is designed to achieve a beam current of 43 mA, a beam voltage of 21.4 kV, and a cross-sectional size of each beam of 0.3 mm × 0.08 mm. A uniform magnetic field of 0.52 T is utilized to focus the dual electron beams, and a beam transmission efficiency of 97.1% is achieved over a length of 50 mm. Finally, particle in cell simulation results show that the integrated dual-beam TWT can generate an output power of 5 W over the frequency range of 315 GHz to 350 GHz, with the maximum output power of 24.5 W at 330 GHz.
ISSN: 1070-664X
DOI: 10.1063/1.5096331
Rights: © 2019 The Author(s). All rights reserved. This paper was published by AIP in Physics of Plasmas and is made available with permission of The Author(s).
Fulltext Permission: open
Fulltext Availability: With Fulltext
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