Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/89019
Title: Phase shift reflectometry for wafer inspection
Authors: Peng, Kuang
Cao, Yiping
Li, Hongru
Sun, Jianfei
Bourgade, Thomas
Asundi, Anand Krishna
Keywords: Phase Shift Reflectometry
DRNTU::Engineering::Mechanical engineering
Specular Surface
Issue Date: 2015
Source: Peng, K., Cao, Y., Li, H., Sun, J., Bourgade, T., & Asundi, A. K. (2015). Phase shift reflectometry for wafer inspection. Proceedings of SPIE - International Conference on Optical and Photonic Engineering (icOPEN2015), 9524, 95242T-. doi:10.1117/12.2190644
Abstract: In 3D measurement, specular surfaces can be reconstructed by phase shift reflectometry and the system configuration is simple. In this paper, a wafer is measured for industrial inspection to make sure the quality of the wafer by calibrating, phase unwrapping, slope calculation and integration. The profile result of the whole wafer can be reconstructed and it is a curve. As the height of the structures on the wafer is the target we are interested in, by fitting and subtracting the curve surface, the structures on the wafer can be observed on the flat surface. To confirm the quality farther, a part of the wafer is captured and zoomed in to be detected so that the difference between two structures can be observed better.
URI: https://hdl.handle.net/10356/89019
http://hdl.handle.net/10220/47013
DOI: 10.1117/12.2190644
Rights: © 2015 Society of Photo-optical Instrumentation Engineers (SPIE). This paper was published in Proceedings of SPIE - International Conference on Optical and Photonic Engineering (icOPEN2015) and is made available as an electronic reprint (preprint) with permission of Society of Photo-optical Instrumentation Engineers (SPIE). The published version is available at: [http://dx.doi.org/10.1117/12.2190644]. One print or electronic copy may be made for personal use only. Systematic or multiple reproduction, distribution to multiple locations via electronic or other means, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper is prohibited and is subject to penalties under law.
Fulltext Permission: open
Fulltext Availability: With Fulltext
Appears in Collections:MAE Conference Papers

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