Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/89019
Full metadata record
DC FieldValueLanguage
dc.contributor.authorPeng, Kuangen
dc.contributor.authorCao, Yipingen
dc.contributor.authorLi, Hongruen
dc.contributor.authorSun, Jianfeien
dc.contributor.authorBourgade, Thomasen
dc.contributor.authorAsundi, Anand Krishnaen
dc.contributor.editorAsundi, Anand K.en
dc.contributor.editorFu, Yuen
dc.date.accessioned2018-12-17T08:28:26Zen
dc.date.accessioned2019-12-06T17:16:03Z-
dc.date.available2018-12-17T08:28:26Zen
dc.date.available2019-12-06T17:16:03Z-
dc.date.issued2015en
dc.identifier.citationPeng, K., Cao, Y., Li, H., Sun, J., Bourgade, T., & Asundi, A. K. (2015). Phase shift reflectometry for wafer inspection. Proceedings of SPIE - International Conference on Optical and Photonic Engineering (icOPEN2015), 9524, 95242T-. doi:10.1117/12.2190644en
dc.identifier.urihttps://hdl.handle.net/10356/89019-
dc.identifier.urihttp://hdl.handle.net/10220/47013en
dc.description.abstractIn 3D measurement, specular surfaces can be reconstructed by phase shift reflectometry and the system configuration is simple. In this paper, a wafer is measured for industrial inspection to make sure the quality of the wafer by calibrating, phase unwrapping, slope calculation and integration. The profile result of the whole wafer can be reconstructed and it is a curve. As the height of the structures on the wafer is the target we are interested in, by fitting and subtracting the curve surface, the structures on the wafer can be observed on the flat surface. To confirm the quality farther, a part of the wafer is captured and zoomed in to be detected so that the difference between two structures can be observed better.en
dc.format.extent6 p.en
dc.language.isoenen
dc.rights© 2015 Society of Photo-optical Instrumentation Engineers (SPIE). This paper was published in Proceedings of SPIE - International Conference on Optical and Photonic Engineering (icOPEN2015) and is made available as an electronic reprint (preprint) with permission of Society of Photo-optical Instrumentation Engineers (SPIE). The published version is available at: [http://dx.doi.org/10.1117/12.2190644]. One print or electronic copy may be made for personal use only. Systematic or multiple reproduction, distribution to multiple locations via electronic or other means, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper is prohibited and is subject to penalties under law.en
dc.subjectPhase Shift Reflectometryen
dc.subjectDRNTU::Engineering::Mechanical engineeringen
dc.subjectSpecular Surfaceen
dc.titlePhase shift reflectometry for wafer inspectionen
dc.typeConference Paperen
dc.contributor.schoolSchool of Mechanical and Aerospace Engineeringen
dc.contributor.conferenceProceedings of SPIE - International Conference on Optical and Photonic Engineering (icOPEN2015)en
dc.contributor.researchCentre for Optical and Laser Engineeringen
dc.identifier.doihttp://dx.doi.org/10.1117/12.2190644en
dc.description.versionPublished versionen
item.grantfulltextopen-
item.fulltextWith Fulltext-
Appears in Collections:MAE Conference Papers
Files in This Item:
File Description SizeFormat 
Phase shift reflectometry for wafer inspection.pdf845.65 kBAdobe PDFThumbnail
View/Open

Google ScholarTM

Check

Altmetric

Items in DR-NTU are protected by copyright, with all rights reserved, unless otherwise indicated.