Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/89878
Title: Review of mid-infrared mode-locked laser sources in the 2.0 μ m–3.5 μ m spectral region
Authors: Ma, Jie
Qin, Zhipeng
Xie, Guoqiang
Qian, Liejia
Tang, Dingyuan
Keywords: Engineering::Electrical and electronic engineering
Lasers
Mid-Wave Infrared
Issue Date: 2019
Source: Ma, J., Qin, Z., Xie, G., Qian, L., & Tang, D. (2019). Review of mid-infrared mode-locked laser sources in the 2.0 μm– 3.5 μm spectral region. Applied Physics Reviews, 6(2), 021317-. doi:10.1063/1.5037274
Series/Report no.: Applied Physics Reviews
Abstract: Ultrafast laser sources operating in the mid-infrared (mid-IR) region, which contains the characteristic fingerprint spectra of many important molecules and transparent windows of atmosphere, are of significant importance in a variety of applications. Over the past decade, a significant progress has been made in the development of inexpensive, compact, high-efficiency mid-IR ultrafast mode-locked lasers in the picosecond and femtosecond domains that cover the 2.0 μm–3.5 μm spectral region. These achievements open new opportunities for applications in areas such as molecular spectroscopy, frequency metrology, material processing, and medical diagnostics and treatment. In this review, starting with the introduction of mid-IR mode-locking techniques, we mainly summarize and review the recent progress of mid-IR mode-locked laser sources, including Tm3+-, Ho3+-, and Tm3+/Ho3+-doped all-solid-state and fiber lasers for the 2.0 μm spectral region, Cr2+:ZnSe and Cr2+:ZnS lasers for the 2.4 μm region, and Er3+-, Ho3+/Pr3+-, and Dy3+-doped fluoride fiber lasers for the 2.8 μm–3.5 μm region. Then, some emerging and representative applications of mid-IR ultrafast mode-locked laser sources are presented and illustrated. Finally, outlooks and challenges for future development of ultrafast mid-IR laser sources are discussed and analyzed. The development of ultrafast mid-IR laser sources, together with the ongoing progress in related application technologies, will create new avenues of research and expand unexplored applications in scientific research, industry, and other fields.
URI: https://hdl.handle.net/10356/89878
http://hdl.handle.net/10220/49346
DOI: 10.1063/1.5037274
Schools: School of Electrical and Electronic Engineering 
Rights: © 2019 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).
Fulltext Permission: open
Fulltext Availability: With Fulltext
Appears in Collections:EEE Journal Articles

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