Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/90287
Title: Fine electron biprism on a Si-on-insulator chip for off-axis electron holography
Authors: Duchamp, Martial
Girard, Olivier
Pozzi, Giulio
Soltner, Helmut
Winkler, Florian
Speen, Rolf
Dunin-Borkowski, Rafal E.
Cooper, David
Keywords: Electron
Biprism
DRNTU::Engineering::Materials
Issue Date: 2017
Source: Duchamp, M., Girard, O., Pozzi, G., Soltner, H., Winkler, F., Speen, R., . . . Cooper, D. (2017). Fine electron biprism on a Si-on-insulator chip for off-axis electron holography. Ultramicroscopy, 185, 81-89. doi:10.1016/j.ultramic.2017.11.012
Series/Report no.: Ultramicroscopy
Abstract: Off-axis electron holography allows both the amplitude and the phase shift of an electron wavefield propagating through a specimen in a transmission electron microscope to be recovered. The technique requires the use of an electron biprism to deflect an object wave and a reference wave to form an interference pattern. Here, we introduce an approach based on semiconductor processing technology to fabricate fine electron biprisms with rectangular cross-sections. By performing electrostatic calculations and preliminary experiments, we demonstrate that such biprisms promise improved performance for electron holography experiments.
URI: https://hdl.handle.net/10356/90287
http://hdl.handle.net/10220/48487
ISSN: 0304-3991
DOI: 10.1016/j.ultramic.2017.11.012
Rights: © 2017 The Authors. Published by Elsevier B.V. This is an open access article under the CC BY-NC-ND license. (http://creativecommons.org/licenses/by-nc-nd/4.0/)
Fulltext Permission: open
Fulltext Availability: With Fulltext
Appears in Collections:MSE Journal Articles

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