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|Title:||Dual nanowire silicon MOSFET with silicon bridge and TaN gate||Authors:||Theng, A. L.
Goh, Wang Ling
Ng, C. M.
|Keywords:||DRNTU::Engineering::Electrical and electronic engineering||Issue Date:||2008||Source:||Theng, A. L., Goh, W. L., Ng, C. M., Chan, L. & Lo, G. Q. (2008). Dual Nanowire Silicon MOSFET with Silicon Bridge and TaN Gate. IEEE Transactions on Nanotechnology. 7(6), 795-799.||Series/Report no.:||IEEE transactions on nanotechnology||Abstract:||This paper demonstrates a high performance silicon nanowire mosfet built on silicon-on-insulator (SOI) platform. Stress-limiting oxidation technique was exploited for dual nanowire channel formation. To further improve the performance of the device, TaN metal gate is used instead of the conventional polysilicon gate. The thin silicon bridge between the two nanowires provides a small boost in the drive current, without degrading the short channel performance. The novel structures are able to achieve excellent electrical performances, high drive current of 927 μA/μm for p-channel and 554 μA/μm for n-channel, near ideal subthreshold slope (SS), and low drain-induced barrier lowering (DIBL).||URI:||https://hdl.handle.net/10356/92303
|ISSN:||1536-125X||DOI:||10.1109/TNANO.2008.917845||Rights:||© 2008 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE. This material is presented to ensure timely dissemination of scholarly and technical work. Copyright and all rights therein are retained by authors or by other copyright holders. All persons copying this information are expected to adhere to the terms and constraints invoked by each author's copyright. In most cases, these works may not be reposted without the explicit permission of the copyright holder. http://www.ieee.org/portal/site This material is presented to ensure timely dissemination of scholarly and technical work. Copyright and all rights therein are retained by authors or by other copyright holders. All persons copying this information are expected to adhere to the terms and constraints invoked by each author's copyright. In most cases, these works may not be reposted without the explicit permission of the copyright holder.||Fulltext Permission:||open||Fulltext Availability:||With Fulltext|
|Appears in Collections:||EEE Journal Articles|
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