Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/94306
Title: Nanolithography of single-layer graphene oxide films by atomic force microscopy
Authors: Lu, Gang
Zhou, Xiaozhu
Li, Hai
Yin, Zongyou
Li, Bing
Huang, Ling
Boey, Freddy Yin Chiang
Zhang, Hua
Keywords: DRNTU::Engineering::Materials
Issue Date: 2010
Source: Lu, G., Zhou, X., Li, H., Yin, Z., Li, B., Huang, L., et al. (2010). Nanolithography of single-layer graphene oxide films by atomic force microscopy. Langmuir, 26(9), 6164-6166.
Series/Report no.: Langmuir
Abstract: Atomic force microscopy-based nanolithography is used to generate the single-layer graphene oxide (GO) patterns on Si/SiO2 substrates. In this process, a Si tip is used to scratch GO films, resulting in GO-free trenches. Using this method, various single-layer GO patterns such as gaps, ribbons, squares, triangles, and zigzags can be easily fabricated. By using the GO patterns as templates, the hybrid GO-Ag nanoparticle patterns were obtained. Our study provides a flexible, simple, convenient method for generating GO patterns on solid substrates, which could be useful for graphene material-based device applications.
URI: https://hdl.handle.net/10356/94306
http://hdl.handle.net/10220/8603
ISSN: 0743-7463
DOI: 10.1021/la101077t
Rights: © 2010 American Chemical Society.
Fulltext Permission: none
Fulltext Availability: No Fulltext
Appears in Collections:MSE Journal Articles

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