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|Title:||Nanolithography of single-layer graphene oxide films by atomic force microscopy||Authors:||Lu, Gang
Boey, Freddy Yin Chiang
|Keywords:||DRNTU::Engineering::Materials||Issue Date:||2010||Source:||Lu, G., Zhou, X., Li, H., Yin, Z., Li, B., Huang, L., et al. (2010). Nanolithography of single-layer graphene oxide films by atomic force microscopy. Langmuir, 26(9), 6164-6166.||Series/Report no.:||Langmuir||Abstract:||Atomic force microscopy-based nanolithography is used to generate the single-layer graphene oxide (GO) patterns on Si/SiO2 substrates. In this process, a Si tip is used to scratch GO films, resulting in GO-free trenches. Using this method, various single-layer GO patterns such as gaps, ribbons, squares, triangles, and zigzags can be easily fabricated. By using the GO patterns as templates, the hybrid GO-Ag nanoparticle patterns were obtained. Our study provides a flexible, simple, convenient method for generating GO patterns on solid substrates, which could be useful for graphene material-based device applications.||URI:||https://hdl.handle.net/10356/94306
|ISSN:||0743-7463||DOI:||10.1021/la101077t||Rights:||© 2010 American Chemical Society.||Fulltext Permission:||none||Fulltext Availability:||No Fulltext|
|Appears in Collections:||MSE Journal Articles|
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