Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/94306
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dc.contributor.authorLu, Gangen
dc.contributor.authorZhou, Xiaozhuen
dc.contributor.authorLi, Haien
dc.contributor.authorYin, Zongyouen
dc.contributor.authorLi, Bingen
dc.contributor.authorHuang, Lingen
dc.contributor.authorBoey, Freddy Yin Chiangen
dc.contributor.authorZhang, Huaen
dc.date.accessioned2012-09-24T00:51:29Zen
dc.date.accessioned2019-12-06T18:53:53Z-
dc.date.available2012-09-24T00:51:29Zen
dc.date.available2019-12-06T18:53:53Z-
dc.date.copyright2010en
dc.date.issued2010en
dc.identifier.citationLu, G., Zhou, X., Li, H., Yin, Z., Li, B., Huang, L., et al. (2010). Nanolithography of single-layer graphene oxide films by atomic force microscopy. Langmuir, 26(9), 6164-6166.en
dc.identifier.issn0743-7463en
dc.identifier.urihttps://hdl.handle.net/10356/94306-
dc.description.abstractAtomic force microscopy-based nanolithography is used to generate the single-layer graphene oxide (GO) patterns on Si/SiO2 substrates. In this process, a Si tip is used to scratch GO films, resulting in GO-free trenches. Using this method, various single-layer GO patterns such as gaps, ribbons, squares, triangles, and zigzags can be easily fabricated. By using the GO patterns as templates, the hybrid GO-Ag nanoparticle patterns were obtained. Our study provides a flexible, simple, convenient method for generating GO patterns on solid substrates, which could be useful for graphene material-based device applications.en
dc.language.isoenen
dc.relation.ispartofseriesLangmuiren
dc.rights© 2010 American Chemical Society.en
dc.subjectDRNTU::Engineering::Materialsen
dc.titleNanolithography of single-layer graphene oxide films by atomic force microscopyen
dc.typeJournal Articleen
dc.contributor.schoolSchool of Materials Science & Engineeringen
dc.identifier.doi10.1021/la101077ten
item.grantfulltextnone-
item.fulltextNo Fulltext-
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