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|Title:||Electrochemical deposition of Cl-doped n-type Cu2O on reduced graphene oxide electrodes||Authors:||Wu, Shixin
|Keywords:||DRNTU::Engineering::Materials||Issue Date:||2011||Source:||Wu, S., Yin, Z., He, Q., Lu, G., Zhou, X., & Zhang, H. (2011). Electrochemical deposition of Cl-doped n-type Cu2O on reduced graphene oxide electrodes. Journal of Materials Chemistry, 21, 3467-3470.||Series/Report no.:||Journal of materials chemistry||Abstract:||Reduced graphene oxide (rGO) electrodes can be applied for the electrochemical deposition of various semiconductor oxides. In this study, we demonstrate the electrochemical deposition of Cl-doped n-type Cu2O (Cl–Cu2O) on rGO electrodes. The structure and properties of the deposited Cl–Cu2O have been investigated extensively. Moreover, the effect of Cl doping on the carrier concentration and photocurrent of Cl–Cu2O has also been investigated. Our study shows significant implications in tailoring the properties of materials deposited on rGO electrodes by using electrochemical methods.||URI:||https://hdl.handle.net/10356/94380
|DOI:||10.1039/c0jm02267e||Rights:||© 2011 The Royal Society of Chemistry. This is the author created version of a work that has been peer reviewed and accepted for publication by Journal of Materials Chemistry, The Royal Society of Chemistry. It incorporates referee’s comments but changes resulting from the publishing process, such as copyediting, structural formatting, may not be reflected in this document. The published version is available at: http://dx.doi.org/10.1039/c0jm02267e.||Fulltext Permission:||open||Fulltext Availability:||With Fulltext|
|Appears in Collections:||MSE Journal Articles|
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