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|Title:||Plasmon-enhanced polarized Raman spectroscopy for sensitive surface characterization||Authors:||Ni, Zhenhua
Lee, Pooi See
Tee, X. Y.
You, Y. M.
|Keywords:||DRNTU::Engineering::Materials||Issue Date:||2008||Source:||Kasim, J., Tee, X. Y., You, Y. M., Ni, Z. H., Setiawan, Y., Lee, P. S., et al. (2008). Plasmon-enhanced polarized Raman spectroscopy for sensitive surface characterization. Journal of raman spectroscopy, 39(10), 1338-1342.||Series/Report no.:||Journal of Raman spectroscopy||Abstract:||Local-mode and localized surface plasmons generated on the silver thin film can selectively enhance the Raman signal from the surface. Further improvement of surface signal can be obtained by using the polarized Raman technique that results in a dramatic enhancement of the surface sensitivity by up to 25.4 times as compared to that without a silver coating. This technique will be very useful for Raman study on samples that suffer overlapping background signal. In this article, we show that it can be used to significantly improve the signal of thin strained-Si layer on top of SiGe buffer layer.||URI:||https://hdl.handle.net/10356/94736
|DOI:||10.1002/jrs.1999||Rights:||© 2008 John Wiley & Sons, Ltd.||Fulltext Permission:||none||Fulltext Availability:||No Fulltext|
|Appears in Collections:||MSE Journal Articles|
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