Please use this identifier to cite or link to this item:
Title: Thermal stability of rare-earth based ultrathin Lu2O3 for high-k dielectrics
Authors: Darmawan, P.
Setiawan, Y.
Lai, J. C.
Yang, P.
Lee, Pooi See
Keywords: DRNTU::Engineering::Materials
Issue Date: 2007
Source: Darmawan, P., Lee, P. S., Setiawan, Y., Lai, J. C., & Yang, P. (2007). Thermal stability of rare-earth based ultrathin Lu2O3 for high-k dielectrics. Journal of Vacuum Science & Technology B, 25(4), 1203.
Series/Report no.: Journal of vacuum science & technology B
Abstract: Lu2O3 thin film was deposited on n-type (100) Si substrates using pulsed laser deposition. A k value of 15.95 with an equivalent oxide thickness (EOT) of 1.10 nm and a current density of 2.6×10−5 A/cm2 at +1 V accumulation bias is achievable for the 4.5 nm thick Lu2O3 thin film deposited at room temperature after postdeposition annealing at 600 °C in oxygen ambient. Annealing a similar sample at 900 °C caused the EOT and leakage current density to increase to 1.68 nm and 1×10−4 A/cm2, respectively. High resolution transmission electron microscopy analysis has shown that Lu2O3 film remains amorphous at high temperature annealing at 900 °C. An x-ray reflectivity analysis on a separately prepared sample with lower annealing temperature (800 °C) suggested a formation of Lu-based silicate layer. It is believed that the formation of low-k silicate layer may have contributed to the observed increase in EOT and the reduction in the k value.
ISSN: 10711023
DOI: 10.1116/1.2749526
Rights: © 2007 American Vacuum Society. This paper was published in Journal of Vacuum Science & Technology B and is made available as an electronic reprint (preprint) with permission of American Vacuum Society. The paper can be found at DOI: []. One print or electronic copy may be made for personal use only. Systematic or multiple reproduction, distribution to multiple locations via electronic or other means, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper is prohibited and is subject to penalties under law.
Fulltext Permission: open
Fulltext Availability: With Fulltext
Appears in Collections:MSE Journal Articles

Files in This Item:
File Description SizeFormat 
62. Thermal stability of rare-earth based ultrathin Lu2O3 for high-k dielectrics.pdf645.89 kBAdobe PDFThumbnail

Citations 10

Updated on Mar 6, 2021

Citations 10

Updated on Mar 8, 2021

Page view(s) 10

Updated on May 18, 2022

Download(s) 5

Updated on May 18, 2022

Google ScholarTM




Items in DR-NTU are protected by copyright, with all rights reserved, unless otherwise indicated.