Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/95000
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dc.contributor.authorSetiawan, Y.en
dc.contributor.authorLee, Pooi Seeen
dc.contributor.authorPey, Kin Leongen
dc.contributor.authorWang, X. C.en
dc.contributor.authorLim, G. C.en
dc.date.accessioned2012-05-17T09:17:02Zen
dc.date.accessioned2019-12-06T19:06:12Z-
dc.date.available2012-05-17T09:17:02Zen
dc.date.available2019-12-06T19:06:12Z-
dc.date.copyright2006en
dc.date.issued2006en
dc.identifier.citationSetiawan, Y., Lee, P. S., Pey, K. L., Wang, X. C., & Lim, G. C. (2006). Laser induced Ni(Ti) silicide formation. Applied Physics Letters, 88(11).en
dc.identifier.urihttps://hdl.handle.net/10356/95000-
dc.description.abstractEffects of Ti alloying during laser-induced Ni silicide formation is studied. Unique triple layer microstructures were found with the presence of supercell in the NiSi2 grains formed at the interface. This supercell formation was caused by a local ordering of Ni and Si atoms that favor lower free energy during rapid solidification. Ti rapidly segregates from the alloy melt and forms a protective TiOx overlayer on the surface during solidification. Melt front progressing towards the Ni-rich region leads to quenching of an amorphous layer sandwiched between NiSi2 grains and the TiOx overlayer.en
dc.format.extent3 p.en
dc.language.isoenen
dc.relation.ispartofseriesApplied physics lettersen
dc.rights© 2006 American Institute of Physics. This paper was published in Applied Physics Letters and is made available as an electronic reprint (preprint) with permission of American Institute of Physics. The paper can be found at the following official URL: http://dx.doi.org/10.1063/1.2186073. One print or electronic copy may be made for personal use only. Systematic or multiple reproduction, distribution to multiple locations via electronic or other means, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper is prohibited and is subject to penalties under law.en
dc.subjectDRNTU::Engineering::Materials::Microelectronics and semiconductor materialsen
dc.titleLaser induced Ni(Ti) silicide formationen
dc.typeJournal Articleen
dc.contributor.schoolSchool of Materials Science & Engineeringen
dc.identifier.doi10.1063/1.2186073en
dc.description.versionPublished versionen
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