Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/95033
Title: Demonstration of low-loss on-chip integrated plasmonic waveguide based on simple fabrication steps on silicon-on-insulator platform
Authors: Tobing, Landobasa Yosef Mario A. L.
Tjahjana, Liliana
Zhang, Dao Hua
Issue Date: 2012
Source: Tobing, L. Y. M. A. L., Tjahjana, L., & Zhang, D. H. (2012). Demonstration of low-loss on-chip integrated plasmonic waveguide based on simple fabrication steps on silicon-on-insulator platform. Applied physics letters, 101(4), 041117-.
Series/Report no.: Applied physics letters
Abstract: We report the experimental realization of a robust silicon-based plasmonic waveguide structure which can theoretically provide sub-wavelength confinement for Ex- and Ey-polarized surface plasmon polariton modes. Our waveguides exhibit propagation loss as low as 0.2 dB/lm with 50% coupling efficiency.
URI: https://hdl.handle.net/10356/95033
http://hdl.handle.net/10220/9201
ISSN: 0003-6951
DOI: 10.1063/1.4739523
Rights: © 2012 American Institute of Physics. This paper was published in Applied Physics Letters and is made available as an electronic reprint (preprint) with permission of American Institute of Physics. The paper can be found at the following official DOI: [http://dx.doi.org/10.1063/1.4739523].  One print or electronic copy may be made for personal use only. Systematic or multiple reproduction, distribution to multiple locations via electronic or other means, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper is prohibited and is subject to penalties under law.
Fulltext Permission: open
Fulltext Availability: With Fulltext
Appears in Collections:EEE Journal Articles

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