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Title: Dip pen nanolithography and its potential for nanoelectronics
Authors: Rosner, Bjoern
Disawal, Sandeep
Zhang, Hua
Rendlen, Jeff
Duenas, Tenisa
Shile, Roger
Fragala, Joe
Elghanian, Robert
Demers, Linette M.
Amro, Nabil A.
Keywords: DRNTU::Engineering::Materials
Issue Date: 2004
Source: Rosner, B., Amro, N., Disawal, S., Demers, L. M., Zhang, Hua, Rendlen, J., et al. (2004). Dip Pen Nanolithography and Its Potential for Nanoelectronics. In 2004 4th IEEE Conference on Nanotechnology, pp.59-61.
Abstract: Dip pen nanolithography (DPN) is a patterning technique for nanoscale science and engineering based on scanning probe microscopy. Its main advantages are very high resolution, the unique capability to deposit many different materials directly onto a substrate and low cost of ownership. We present here new research and development efforts that demonstrate the potential of DPN as a tool to produce nanoelectronic devices and circuits. We show the direct deposition of electronic materials as well as the use of external accessories to accelerate the development phase of nanoelectronic components.
DOI: 10.1109/NANO.2004.1392249
Rights: © 2004 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works. The published version is available at: [DOI: 10.1109/NANO.2004.1392249].
Fulltext Permission: open
Fulltext Availability: With Fulltext
Appears in Collections:MSE Conference Papers

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