Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/95842
Title: Deposition of Ni/TiN composite coatings by a plasma assisted MOCVD using an organometallic precursor
Authors: Maiyalagan, Thandavarayan
Arockiasamy, S.
Kuppusami, P.
Mallika, C.
Nagaraja, K. S.
Issue Date: 2012
Source: Arockiasamy, S., Maiyalagan, T., Kuppusami, P., Mallika, C.,& Nagaraja, K. (2012). Deposition of Ni/TiN composite coatings by a plasma assisted MOCVD using an organometallic precursor. Micro and nanosystems, 4(3), 199-207.
Series/Report no.: Micro and nanosystems
Abstract: Titanium nitride (TiN)/nickel (Ni) composite coatings were synthesized by plasma assisted metal-organic chemical vapour deposition (PAMOCVD) using organo-metallic and metal-organic complexes namely dichlorobis( 5- cyclopentadienyl)titanium (IV) for titanium and N,N'-ethylene-bis(2,4-pentanedion-iminoato)nickel(II) for nickel. The growth of such films was investigated in nitrogen (N2) plasma environment in the substrate temperature range of 450- 550ºC at a deposition pressure of 0.5-1 mbar. Prior to the deposition of films, the Ti precursor was subjected to the equilibrium vapour pressure measurements by employing TG/DTA in transpiration mode, which led to the value of 109.2 ± 5.6 kJ mol-1 for the standard enthalpy of sublimation (ΔHo sub). The phase identification using glancing incidence x-ray diffraction showed Ni/TiN is a nanocomposite coating containing nanocrystals of Ni and TiN with face centered cubic structure. Scanning electron microscopy revealed a uniform surface morphology of the films, while chemical analysis by energy dispersive analysis confirmed the presence of titanium, nickel and nitrogen in the composite films.
URI: https://hdl.handle.net/10356/95842
http://hdl.handle.net/10220/11352
ISSN: 1876-4029
DOI: 10.2174/1876402911204030199
Rights: © 2012 Bentham Science Publishers.
Fulltext Permission: none
Fulltext Availability: No Fulltext
Appears in Collections:SCBE Journal Articles

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