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dc.contributor.authorMaiyalagan, Thandavarayanen
dc.contributor.authorArockiasamy, S.en
dc.contributor.authorKuppusami, P.en
dc.contributor.authorMallika, C.en
dc.contributor.authorNagaraja, K. S.en
dc.identifier.citationArockiasamy, S., Maiyalagan, T., Kuppusami, P., Mallika, C.,& Nagaraja, K. (2012). Deposition of Ni/TiN composite coatings by a plasma assisted MOCVD using an organometallic precursor. Micro and nanosystems, 4(3), 199-207.en
dc.description.abstractTitanium nitride (TiN)/nickel (Ni) composite coatings were synthesized by plasma assisted metal-organic chemical vapour deposition (PAMOCVD) using organo-metallic and metal-organic complexes namely dichlorobis( 5- cyclopentadienyl)titanium (IV) for titanium and N,N'-ethylene-bis(2,4-pentanedion-iminoato)nickel(II) for nickel. The growth of such films was investigated in nitrogen (N2) plasma environment in the substrate temperature range of 450- 550ºC at a deposition pressure of 0.5-1 mbar. Prior to the deposition of films, the Ti precursor was subjected to the equilibrium vapour pressure measurements by employing TG/DTA in transpiration mode, which led to the value of 109.2 ± 5.6 kJ mol-1 for the standard enthalpy of sublimation (ΔHo sub). The phase identification using glancing incidence x-ray diffraction showed Ni/TiN is a nanocomposite coating containing nanocrystals of Ni and TiN with face centered cubic structure. Scanning electron microscopy revealed a uniform surface morphology of the films, while chemical analysis by energy dispersive analysis confirmed the presence of titanium, nickel and nitrogen in the composite films.en
dc.relation.ispartofseriesMicro and nanosystemsen
dc.rights© 2012 Bentham Science Publishers.en
dc.titleDeposition of Ni/TiN composite coatings by a plasma assisted MOCVD using an organometallic precursoren
dc.typeJournal Articleen
dc.contributor.schoolSchool of Chemical and Biomedical Engineeringen
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