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|Title:||Fabrication of graphene nanomesh by using an anodic aluminum oxide membrane as a template||Authors:||Zeng, Zhiyuan
Boey, Freddy Yin Chiang
|Issue Date:||2012||Source:||Zeng, Z., Huang, X., Yin, Z., Li, H., Chen, Y., Li, H., et al. (2012). Fabrication of Graphene Nanomesh by Using an Anodic Aluminum Oxide Membrane as a Template. Advanced Materials, 24(30), 4138-4142.||Series/Report no.:||Advanced materials||Abstract:||Large-area graphene nanomesh (GNM) is prepared using a new and effective method, in which the O2 plasma treatment is used with an anodic aluminum oxide (AAO) membrane as an etch mask. By varying the pore size and cell wall thickness of the AAO membrane, GNM with tunable pore size and neck width can be prepared. As proof of concept, a field-effect transistor with 15 nm neck width GNM as the conductive channel is fabricated, which exhibits p-type semiconducting behavior.||URI:||https://hdl.handle.net/10356/97087
|ISSN:||1521-4095||DOI:||10.1002/adma.201104281||Rights:||© 2012 Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim.||Fulltext Permission:||none||Fulltext Availability:||No Fulltext|
|Appears in Collections:||MSE Journal Articles|
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