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Title: Fabrication of graphene nanomesh by using an anodic aluminum oxide membrane as a template
Authors: Zeng, Zhiyuan
Huang, Xiao
Yin, Zongyou
Li, Hong
Chen, Yang
Li, Hai
Zhang, Qing
Ma, Jan
Boey, Freddy Yin Chiang
Zhang, Hua
Issue Date: 2012
Source: Zeng, Z., Huang, X., Yin, Z., Li, H., Chen, Y., Li, H., et al. (2012). Fabrication of Graphene Nanomesh by Using an Anodic Aluminum Oxide Membrane as a Template. Advanced Materials, 24(30), 4138-4142.
Series/Report no.: Advanced materials
Abstract: Large-area graphene nanomesh (GNM) is prepared using a new and effective method, in which the O2 plasma treatment is used with an anodic aluminum oxide (AAO) membrane as an etch mask. By varying the pore size and cell wall thickness of the AAO membrane, GNM with tunable pore size and neck width can be prepared. As proof of concept, a field-effect transistor with 15 nm neck width GNM as the conductive channel is fabricated, which exhibits p-type semiconducting behavior.
ISSN: 1521-4095
DOI: 10.1002/adma.201104281
Rights: © 2012 Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim.
Fulltext Permission: none
Fulltext Availability: No Fulltext
Appears in Collections:MSE Journal Articles

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