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Title: Improved pentacene device characteristics with sol–gel SiO2 dielectric films
Authors: Cahyadi, Tommy
Tan, H. S.
Namdas, E. B.
Mhaisalkar, Subodh Gautam
Lee, Pooi See
Chen, Z. K.
Ng, C. M.
Boey, Freddy Yin Chiang
Keywords: DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
Issue Date: 2006
Source: Cahyadi, T., Tan, H. S., Namdas, E. B., Mhaisalkar, S. G., Lee, P. S., Chen, Z. K., Ng, C. M., & Boey, F. Y. C. (2007). Improved pentacene device characteristics with sol–gel SiO2 dielectric films. Organic electronics, 8(4), 455-459.
Series/Report no.: Organic electronics
Abstract: The interfacial interactions between semiconductors and gate dielectrics have a profound influence on the device characteristics of field effect transistors (FETs). This paper reports on the concept of introducing a sol–gel SiO2 as inorganic capping layer to significantly improve device characteristics of pentacene-based FETs. The smoother film surfaces of sol–gel SiO2 (1.9 Å root-mean-square) induced larger pentacene grain sizes, and led to hole mobilities of 1.43 cm2/Vs, on–off ratio of 107, and a subthreshold swing of 102 mV/decade when operating at −20 V.
ISSN: 1566-1199
DOI: 10.1016/j.orgel.2006.12.006
Rights: © 2006 Elsevier B.V.
Fulltext Permission: none
Fulltext Availability: No Fulltext
Appears in Collections:MSE Journal Articles

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