Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/97345
Title: Nanohole structure as efficient antireflection layer for silicon solar cell fabricated by maskless laser annealing
Authors: Hong, Lei
Rusli
Wang, Fei
He, Lining
Wang, Xincai
Zheng, Hongyu
Wang, Hao
Yu, Hongyu
Keywords: DRNTU::Engineering::Electrical and electronic engineering
Issue Date: 2011
Abstract: In this paper, a uniform nanohole structure on silicon wafer is fabricated using the silver catalyst induced method. The optical properties of the silicon nanohole structure are studied systematically at different nanohole depths. The nanohole arrays demonstrate excellent antireflection property due to its sub-wavelength structure with a low reflection loss of 4% for incident light within the wavelength range of 300-1100 nm. The angular dependence of reflectivity is also investigated. The average reflection decreases at first and then increases as the incident light deviated from normal, with a very lower reflectivity of 0.83% at an incident angle of 20°. The suppressed reflection indicates a strong light trapping ability of the nanohole structure, and provides a low cost method to enhance light absorption and performance for the solar cell application.
URI: https://hdl.handle.net/10356/97345
http://hdl.handle.net/10220/13165
DOI: 10.1109/PVSC.2012.6317965
Fulltext Permission: none
Fulltext Availability: No Fulltext
Appears in Collections:EEE Conference Papers

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