Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/97512
Title: Microstructure array on Si and SiOx generated by micro-contact printing, wet chemical etching and reactive ion etching
Authors: Amro, Nabil A.
Zhang, Hua
Disawal, Sandeep
Elghanian, Robert
Shile, Roger
Fragala, Joseph
Keywords: DRNTU::Engineering::Materials
Issue Date: 2006
Source: Zhang, H., Amro, N. A., Disawal, S., Elghanian, R., Shile, R., & Fragala, J. (2006). Microstructure array on Si and SiOx generated by micro-contact printing, wet chemical etching and reactive ion etching. Applied Surface Science, 253(4), 1960-1963.
Series/Report no.: Applied surface science
Abstract: A method, combining micro-contact printing (μCP), wet chemical etching and reactive ion etching (RIE), is reported to fabricate microstructures on Si and SiOx. Positive and negative structures were generated based on different stamps used for μCP. The reproducibility of the obtained microstructures shows the methodology reported herein could be useful in Micro-Electro-Mechanical Systems (MEMS), optical and biological sensing applications.
URI: https://hdl.handle.net/10356/97512
http://hdl.handle.net/10220/10516
ISSN: 0169-4332
DOI: 10.1016/j.apsusc.2006.03.045
Rights: © 2006 Elsevier B.V.
Fulltext Permission: none
Fulltext Availability: No Fulltext
Appears in Collections:MSE Journal Articles

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