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|Title:||Microstructure array on Si and SiOx generated by micro-contact printing, wet chemical etching and reactive ion etching||Authors:||Amro, Nabil A.
|Keywords:||DRNTU::Engineering::Materials||Issue Date:||2006||Source:||Zhang, H., Amro, N. A., Disawal, S., Elghanian, R., Shile, R., & Fragala, J. (2006). Microstructure array on Si and SiOx generated by micro-contact printing, wet chemical etching and reactive ion etching. Applied Surface Science, 253(4), 1960-1963.||Series/Report no.:||Applied surface science||Abstract:||A method, combining micro-contact printing (μCP), wet chemical etching and reactive ion etching (RIE), is reported to fabricate microstructures on Si and SiOx. Positive and negative structures were generated based on different stamps used for μCP. The reproducibility of the obtained microstructures shows the methodology reported herein could be useful in Micro-Electro-Mechanical Systems (MEMS), optical and biological sensing applications.||URI:||https://hdl.handle.net/10356/97512
|ISSN:||0169-4332||DOI:||10.1016/j.apsusc.2006.03.045||Rights:||© 2006 Elsevier B.V.||Fulltext Permission:||none||Fulltext Availability:||No Fulltext|
|Appears in Collections:||MSE Journal Articles|
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