Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/97870
Title: The substrate cooling effect of ion beam post treatment on ZAO films properties
Authors: Wang, Wenna
Zhang, Dawei
Wang, Qi
Tao, Chuanxian
Ni, Zhengji
Zhuang, Songlin
Mei, Ting
Zhang, Dao Hua
Keywords: DRNTU::Engineering::Electrical and electronic engineering
Issue Date: 2012
Source: Wang, W., Zhang, D., Wang, Q., Tao, C., Ni, Z., Zhuang, S., et al. (2012). The substrate cooling effect of ion beam post treatment on ZAO films properties. 2012 Photonics Global Conference (PGC).
Abstract: ZAO thin films with low surface roughness and low sheet resistance are required in the touch panels and display panels. In this work, we investigated the substrate cooling effect of ion beam post treatment on ZAO films properties, and one new way of obtain low surface roughness and low sheet resistance same time was proposed. The more exciting find of this paper is that, comparing to the samples without cooling during the process of ion beam post treatment, samples with proper cooling voltage show a sheet resistance decrease of 26% (from 11.9 Ω/□ to 8.8 Ω/□) and a roughness decrease of 35.5% (from 13.389 nm to 8.637 nm) without transparency losing. And the viewpoint that substrate cooling has the effect of weakening the crystallization, especially for the sub-face and internal parts of samples is deduced.
URI: https://hdl.handle.net/10356/97870
http://hdl.handle.net/10220/12197
DOI: 10.1109/PGC.2012.6458051
Rights: © 2012 IEEE.
Fulltext Permission: none
Fulltext Availability: No Fulltext
Appears in Collections:EEE Conference Papers

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